The objective of this Invitation to Negotiate (ITN) is to enable Florida State University (FSU) to enter into a contract with a Respondent to provide a high-resolution Electron Beam Lithography System and a high-resolution maskless UV laser lithography system. The systems will be utilized for precise fabrication of micro- and nanoscale structures by writing the patterns with extreme accuracy. • The Electron Beam Lithography System should be capable of sub-10 nm patterning and fully automated operation with a user-friendly software interface. • The maskless UV laser lithography system should be capable of writing fine patterns on wafers or substrates without the need for photomasks, offering flexibility for rapid prototyping. • The systems will be used for various applications, including photomask fabrication, microfluidics, MEMS, and optical devices.