Atomic Layer Deposition (ALD) System

Oregon State University is seeking to purchase an Anric AT‑200M Atomic Layer Deposition (ALD) system from Anric Technologies. The solicitation is a sole‑source award because the equipment’s unique design and compatibility with existing OSU platforms cannot be sourced elsewhere. The system must integrate with specialized antennas, support quartz crystal microbalance (QCM), various plasma processes (hollow cathode and microwave), coat three‑dimensional objects, and operate on high‑temperature substrates. The award will enable OSU research labs to expand advanced thin‑film deposition capabilities. • Procurement is a sole‑source award (ID S216145842HP) with a close date of 05/28/2026 2:30 PM PST. • The ALD system must be fully compatible with OSU’s current equipment and antennas, covering a broad range of deposition processes. • Primary point of contact: Hannah Punches (email provided).