Atomic Layer Deposition (ALD) System

Oregon State University intends to contract with Anric Technologies for the purchase of an Anric AT‑200M Atomic Layer Deposition (ALD) system as a sole source because of the uniqueness (design, capability, nature) of the goods and the goods being compatible with existing equipment. The selected system must be fully compatible with existing equipment and specialized antennas already developed for this platform, and capable of supporting a wide range of deposition processes including QCM, plasma (hollow cathode and microwave), coating of 3D objects, and high‑temperature substrates. An entity may appeal this determination in accordance with OSU Standard 03‑010, Section 5.17 no later than the closing date indicated on the website. Appeals must be submitted to Procurement, Contracts and Materials Management at [email protected] by 05/28/2026 at 2:30PM PST. For additional information, please contact Hannah Punches at [email protected]