PECVD & ICP-RIE Systems for the Nanoscale Fabrication Center

The University of Wisconsin‑Madison is seeking competitive bids for two clean‑room tools: a plasma‑enhanced chemical vapor deposition (PECVD) system and an inductively coupled plasma reactive‑ion etching (ICP‑RIE) system for its Nanoscale Fabrication Center. Bidders must provide complete, all‑inclusive pricing that covers shipping, installation, commissioning, training, warranties, and any required utility interfacing. The solicitation is open to any qualified vendor with a Jaggaer (ShopUW+) profile, and all questions must be submitted through the electronic sourcing module. The award will be based on the lowest net line‑item price that meets the technical specifications and compliance requirements (including NRTL certification, safety interlocks, and warranty terms). • Scope: Supply one PECVD system and one ICP‑RIE system (stand‑alone, 150 mm wafer capacity). • Deliverables: Equipment, freight, installation, on‑site commissioning, operator training, 2‑year warranty, and full technical documentation. • Requirements: Must meet detailed technical specs (dual‑frequency PECVD, metal‑seal MFCs, 208 V 3‑phase power, NRTL certification, safety interlocks, and be capable of meeting utility constraints). • Submission: Electronic bid via ShopUW+ by 23 Oct 2026 2:00 PM CDT; no paper bids accepted.