Reactive Ion Etching System

The University of Missouri is issuing a competitive bid to procure a complete Reactive Ion Etching (RIE) system, including all necessary accessories, delivery, installation, and initial training. The supplier must meet the University’s strict compliance requirements (e.g., accessibility, OSHA, anti‑boycott, and health‑care regulations) and provide warranty documentation. The contract will be awarded to the responsive and responsible bidder who offers the best overall value, with a preference for Missouri‑based firms when comparable. • Equipment: Fully functional Reactive Ion Etching system suitable for semiconductor or materials research. • Scope: Furnish, deliver, install, and provide initial on‑site training and documentation. • Compliance: Must adhere to WCAG 2.2 A/AA, OSHA, anti‑discrimination, and anti‑boycott statutes. • Delivery Deadline: Must be received by the University no later than the bid close date (09/08/2026). • Evaluation: Based on price, technical compliance, warranty, and Missouri‑firm preference.